MOCVD生长前的衬底处理实验研究  

An Experimental Processing Study of Substrates Prior to MOCVD Growth

作　　者：刘国军[1] 徐莉[1] 王喜祥 史全林[1] 张千勇[1] 

机构地区：[1]长春光学精密机械学院近代光学研究所

出　　处：《长春光学精密机械学院学报》1993年第4期58-60,共3页Journal of Changchun Institute of Optics and Fine Mechanics

摘　　要：本文通过实验研究,讨论了实验参数对衬底表面形貌和MOCVD生长样品质量的影响,与文献所给实验条件进行了比较。This paper discusses, through detailed experiments, the effects of substrate processing experimental parameters on substrate morphology and MOVCD-grown epitaxial layer quality. Comparison has been given with other published experimental conditions.

关 键 词：衬底 金属有机化合物 气相淀积 试验 

分 类 号：O621.258[理学—有机化学]