离子束流和基底温度对ZrN/TiAlN纳米多层膜性能的影响  

Deposition Conditions and Mechanical Properties of ZrN/TiAlN Nanoscaled Multilayered Coatings

作　　者：曹猛[1] 李强[1] 杨莹[1] 邓湘云[1] 李德军[1] 

机构地区：[1]天津师范大学物理与电子信息学院,天津300387

出　　处：《真空科学与技术学报》2008年第S1期29-32,共4页Chinese Journal of Vacuum Science and Technology

基　　金：天津市科技计划国际合作项目(No.07ZCGHHZ01500)资助

摘　　要：本文利用高真空离子束辅助沉积系统(IBAD),在室温下制备了ZrN、TiAlN和一系列ZrN/TiAlN纳米多层膜,利用XRD、纳米力学测试系统和多功能材料表面性能实验仪,分析了束流和基底温度对薄膜的微结构和机械性能的影响。结果表明:大部分多层膜的纳米硬度与弹性模量值都高于两种个体材料硬度的平均值,当辅助束流为5mA时,多层膜硬度达到30.6GPa。基底温度的升高,会显著降低薄膜的残余应力,但对薄膜的硬度,摩擦系数没有明显影响。The ZrN/TiAlN nanoscaled,multilayered coatings were grown by ion beam assisted deposition(IBAD)in ultra high vacuum(UHV)at room temperature.The microstructures and mechanical properties of the multi-layers were characterized with X-ray diffraction(XRD),and conventional mechanical probes.The results show that the surface hardness and elastic modulus of the ZrN/TiAlN multi-layers are much higher than those of the rule-of-mixture of monolithic ZrN and TiAlN coatings,and that the ion beam flux and the substrate...

关 键 词：离子束辅助沉积 ZrN/TiAlN纳米多层膜 硬度 离子束流 基底温度 

分 类 号：TB381[一般工业技术—材料科学与工程]