陶瓷薄膜的气相制备及热力学应用  

The manufacture of thin film by vapro method & the application of thermodynamics in this field

作　　者：李先林[1] 郝俊杰[1] 刘连顺[2] 

机构地区：[1]河北理工学院材料系,河北唐山063009 [2]唐山白玉瓷厂,河北唐山063000

出　　处：《河北理工大学学报（自然科学版）》2001年第z1期37-41,52,共6页Journal of Hebei Polytechnic University:Social Science Edition

摘　　要：综述了通过气相法制备陶瓷薄膜的方法 ,介绍了热力学在薄膜生成时的应用 ,讨论了基片温度和沉积速率对薄膜结构的影响 ,并对薄膜与基片间的结合问题进行了简单论述。The methods of CVD(Chemical Vapor Deposition) & PVD (Physical vapor Deposition)were reviewed,and the application of thermodynamics in making thin film was introduced.Then,the effects of two important factors,the temperature and deposition rate,were discussed respectively.In addition,the combination of substrate and thin film was studied briefly.

关 键 词：薄膜 化学气相沉积 物理气相沉积 

分 类 号：TQ174.75+6[化学工程—陶瓷工业]