应用于扩散工艺中的闭管扩散技术  

Technology of Diffusion in Closed Tube

作　　者：向小龙[1] 彭志虹[1] 朱晓明[1] 罗卫国[1] 赵加宝[1] 罗亮[1] 

机构地区：[1]中国电子科技集团公司第四十八研究所,长沙410111

出　　处：《微细加工技术》2006年第6期63-64,共2页Microfabrication Technology

摘　　要：介绍了一种用于晶体硅太阳能电池p-n结制造的闭管扩散技术,它主要是针对目前使用的开管扩散技术的不足而提出的,实践证明,该技术不仅扩散均匀性优,而且节源、节能、环保,同时它还可以运用于其它半导体材料的扩散掺杂工艺。A new diffusion technology was introduced, in which the diffusion took place in a closed tube and was used for preparation of the p-n contacts of the crystalline silicon solar cells. The technology was developed to improve the diffusion in the opening tube. The practical results have proved that the technique not only produces a uniform diffusion but also saves power and prevents from pollution, and it can be used for doping of other semiconductor materials.

关 键 词：闭管扩散技术 扩散均匀性 

分 类 号：TN305.7[电子电信—物理电子学]