EB-PVD工艺制备SiC/ZrO_2涂层的微观组织结构研究  

Research on Microstructure of SiC/ZrO_2 Film Deposited by EB-PVD Technology

作　　者：赵轶杰[1] 马李[2] 赫晓东 

机构地区：[1]哈尔滨工业大学复合材料与结构研究所,哈尔滨150080 [2]台州学院物理与电子工程学院,浙江台州318000

出　　处：《材料工程》2009年第S2期4-8,14,共6页Journal of Materials Engineering

基　　金：新世纪优秀人才支持计划资助(NCET2004)

摘　　要：本文利用EB-PVD工艺在高温合金表面制备SiC/ZrO2防热涂层,对制备态和不同温度晶化处理后的涂层进行了微观组织结构分析。结果表明,随退火温度升高,SiC结晶程度提高,Ramam光谱出现了SiC的TO带和LO带;SiC层中分散的sp2杂化碳团簇产生了急剧的聚集,形成了大的团簇结构。退火处理后SiC表层发生钝性氧化,涂层表面C元素含量大幅度减少,而O元素含量迅速增加;XPSC1s和Si2p谱峰的中心向高结合能方向发生了偏移;表层中C-C键的含量减少,Si-O键的含量逐渐增加。SiC/ZrO2 thermal protective coating was deposited on super alloy by EB-PVD technique,and a series of analysis on the microstructure of originality and treated amorphous coatings were made in different temperature.The results show that with annealing temperature rising,TO and LO band of SiC were found in Raman spectroscopy results and sp2 hybridized C in the SiC coating come to be cluster.Due to the passive oxidation,C content in the surface of Si-C coating reduced in a wide range and O content increased rapidly.The peaks of XPS C1s and Si2p spectra shifted to the direction of high binding energy.It was found that the content of C-C bond was reduced and the content of Si-O band was increased on the surface of the annealed SiC coating.

关 键 词：防热涂层 电子束物理气相沉积 微观组织结构 碳化硅 

分 类 号：TG174.4[金属学及工艺—金属表面处理]