低能离子束方法制备磁性Fe-Si合金薄膜  

Magnetic Fe-Si alloy films prepared by low energy ion beam technique

作　　者：刘力锋[1] 陈诺夫[1] 张富强[1] 陈晨龙[1] 李艳丽[1] 杨少延[1] 刘志凯[1] 

机构地区：[1]中国科学院半导体研究所半导体材料科学重点实验室,北京100083

出　　处：《功能材料》2004年第4期429-431,共3页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(60176001);国家重大基础研究计划资助项目(G20000365和G2002CB311905)

摘　　要：　利用质量分离的低能离子束技术,获得了磁性Fe Si合金薄膜。利用俄歇电子能谱法(AES)、X射线衍射法(XRD)以及交变梯度样品磁强计(AGM)测试了样品的组分、结构以及磁特性。测试结果表明在室温下制备的Fe Si合金是Fe组分渐变的非晶薄膜,具有室温铁磁性。当衬底温度为300℃时制备的非晶Fe Si薄膜中有Fe硅化物FeSi相产生,样品的铁磁性被抑制。Magnetic Fe-Si alloy films were prepared by mass-analyzed low energy ion beam technique. The compositional and structural properties of samples are analyzed by auger electron spectroscopy and X ray diffraction spectrum. Magnetization measurements are performed using alternating gradient magnetometer. The measurement results show the Fe-Si alloy was amorphous when the growth temperature was at the room temperature. Samples show room-temperature ferromagnetism. When growth temperature was up to 300°C, iron monosilicide was formed in amorphous Fe-Si alloy. The ferromagnetism of sample was suppressed.

关 键 词：低能离子束 硅 铁磁性 磁性半导体 

分 类 号：TN304.7[电子电信—物理电子学]