轻质碳化硅平面反射镜超光滑表面加工  

Supersmooth surfacing fabrication for lightweight silicon carbide plan mirror

作　　者：徐清兰[1] 伍凡[1] 吴时彬[1] 王家金[1] 

机构地区：[1]中国科学院光电技术研究所,四川成都610209

出　　处：《光电工程》2004年第9期22-25,共4页Opto-Electronic Engineering

摘　　要：介绍了对角线为110mm六边形反应烧结轻质碳化硅平面反射镜超光滑光学加工工艺流程。详细阐述了各个工序所使用的磨具、磨料和抛光机床工艺参数,对实际加工的轻质碳化硅平面反射镜超光滑表面进行检测,检测结果为:面形精度均方根值(RMS)为0.011λ(PV值为0.071,λ=632.8nm),表面粗糙度RMS达0.75nm。Optical fabrication process of a hexagonal reaction-burned lightweight silicon carbide(SiC) mirror with diagonal line 110mm is introduced. The grinding tools, abrasives and polishing machine tools as well as process parameters used in various working procedure are expounded in detail. The lightweight SiC plane mirror is tested. The results show that root-mean-square value of surface figure is 7nm (0.071λ for PV, λ=632.8nm),and root-mean-square of surface roughness reaches 0.75nm..

关 键 词：轻质平面反射镜 光学加工 粗糙度 抛光 面形精度 

分 类 号：TB851[一般工业技术—摄影技术] TQ171.684[化学工程—玻璃工业]