一种可制作任意纳米图形的新技术  

A novel technology to fabricate the arbitrary nanopattern

作　　者：石建平[1] 陈旭南[1] 陈献忠[1] 高洪涛[1] 

机构地区：[1]中国科学院光电技术研究所微细加工光学技术国家重点实验室,四川成都610209

出　　处：《微纳电子技术》2004年第8期1-5,20,共6页Micronanoelectronic Technology

基　　金：中国科学院创新基金资助项目(A2K0009);中科院光电技术研究所所长基金资助(CK0211)

摘　　要：提出一种可制作纳米量级任意微细结构图形的新方法。该方法利用特别设计制作的原子束计算全息片来操纵原子运动,在基底堆积形成纳米图形;弥补了原子光刻技术中利用激光驻波场控制原子堆积只能制作单一量子点、线等周期性图形的不足。扼要介绍了原子束全息的基本原理,给出该项技术的实现方案,并进行了模拟研究。结果显示:当原子波长为12nm时,得到了占空比1∶1的50nm线条、60nm方孔以及1郾2μm×1郾2μm大小的汉字图像,表明该技术不仅可以制作点、线等规则图形以及像拐角线这样的周期性图形,还可以制作不规则的非周期性的任意图形,特征线宽均能达几十纳米。A new technology using atomic hologram to manipulate the atoms movement is presented which can fabricate arbitrary nano-pattern resorted to an unique atom hologram. It can make up the shortage that only the periodic dots or lines can be made when using laser standing wave field to control the atoms to stack on wafer in atom lithography. The based theory of atomic hologram is introduced,and then the technological plan is shown. The simulated research was carried out,and the results show that lines of 50 nm,dots of 60 nm with MSR 1∶1 and the pattern of 1.2 μm×1.2 μm are obtained. This indicates that this technology can not only fabricate the periodic patterns such as lines,dots and corner lines etc,but also the arbitrary micro patterns with nanometer resolution.

关 键 词：纳米结构制作 激光冷却 原子全息 

分 类 号：TN249[电子电信—物理电子学]