Ti6Al4V合金等离子体基离子注氧层XPS研究  

XPS study of surface modified layer of Ti6Al4V alloy implanted with oxygen by plasma base ion implantation

作　　者：李金龙[1] 孙明仁[1] 马欣新[1] 

机构地区：[1]哈尔滨工业大学材料科学与工程学院,哈尔滨150001

出　　处：《中国有色金属学报》2004年第9期1615-1620,共6页The Chinese Journal of Nonferrous Metals

摘　　要：采用等离子体基离子注氧技术(O2 PBII)对Ti6Al4V合金进行了表面改性处理,实验过程中改变注入离子能量的工艺参数,负脉冲偏压分别为10、20、30kV,离子注入过程中样品台通油冷却以实现低温注入;用XPS对离子注氧层的深度、成分及化学结构进行了系统的分析。结果表明:随着注入离子能量的增加,Ti6Al4V合金表面改性层的深度明显增加,改性层的外层由一定厚度的TiO2组成,外层与内层基体之间存在Ti2O3和TiO;Al元素在改性层的外层以氧化物形式存在,且该氧化物趋于表面生长;在表面改性层的外层未发现V及其氧化物。The modified layers by O_2-PBII technology on Ti6Al4V alloy surface were studied using X-ray photoelectron spectroscopy (XPS). The negative pulse voltage of 10, 20, 30 kV was applied to the sample, which was mounted on an oil-cooled sample holder. The results show that the thickness of the oxide layer increases with increasing implanted ion energy. The oxide layer is predominantly TiO_2, which contains a small amount of suboxides TiO and Ti_2O_3 between the outmost layer and metallic substrate. The XPS analysis confirms that Al_2O_3 is located mainly in the outer surface of the modified layers, in which vanadium and vanadium oxide are not detected.

关 键 词：等离子体基离子注入 XPS分析 化学态 

分 类 号：TG146.2[一般工业技术—材料科学与工程] TG178[金属学及工艺—金属材料]