激光驻波原子透镜的像差分析  

Aberration analysis of atom lens generated by a laser standing wave

作　　者：陈献忠[1] 姚汉民[1] 陈旭南[1] 石建平[1] 张春梅[1] 

机构地区：[1]中国科学院光电技术研究所,四川成都610209

出　　处：《强激光与粒子束》2004年第10期1233-1239,共7页High Power Laser and Particle Beams

基　　金：中国科学院知识创新工程项目资助课题(A2K0009);微细加工光学技术国家重点实验室开放基金资助课题

摘　　要：　用激光驻波构成的原子透镜对原子束实现nm量级的聚焦,由于原子束的速度扩散、束扩散和原子的波动特性等因素的影响,原子透镜存在像差。建立了两种描述原子透镜的理论模型,用半经典模型分析原子透镜的球差、色差及由原子束的发散角引起的像差,用量子模型分析原子透镜的衍射像差。模拟结果表明原子束的发散角是产生像差的主要因素,衍射像差大于球差和色差。提出了优化实验参数、增加束掩模和利用刻蚀技术三种改善原子光刻实验的方法。Atom lens generated by a laser standing wave can be used to focus an atomic beam to nanometer dimensions. Aberrations exist in atom lens owing to the influence of velocity spread, beam spread, wave nature of atoms and so on. Two theoretical models were built to describe atom lens. Spherical aberration, chromatic aberration and the aberration caused by angular spread were analyzed with semi-classical model, and diffractive aberration was analyzed using quantum model. Simulation results show that aberration originates mainly from beam spread, and diffractive aberration is larger than spherical aberration and chromatic aberration. Three solutions of optimization of experimental parameters, adding beam mask and using etching technologies for improving atom lithography quality are presented.

关 键 词：激光驻波场 原子透镜 像差分析 光刻技术 

分 类 号：O435.2[机械工程—光学工程] TN305[理学—光学]