离子辅助沉积对Nb_2O_5薄膜特性的影响  

Study on performance of Nb_2O_5 films with ion assisted deposition

作　　者：张德景[1] 李明宇[1] 顾培夫[1] 

机构地区：[1]浙江大学现代光学仪器国家重点实验室,浙江杭州310027

出　　处：《浙江大学学报（工学版）》2004年第10期1387-1390,共4页Journal of Zhejiang University：Engineering Science

基　　金：国家自然科学基金资助项目(6007801).

摘　　要：为了提高Nb2O5薄膜的聚集密度,改善氧化铌薄膜的光学特性和机械特性,采用霍尔源离子辅助沉积(IDA)技术在K9玻璃基板上制备了Nb2O5单层薄膜,并与常规沉积条件下制备的Nb2O5薄膜作了比较.由于IAD技术使Nb2O5膜的聚集密度提高了14%,膜层折射率从常规工艺的2.03上升到2.18,膜层的附着力和牢固度从常规工艺的1.0×107N/m2提高到129.7×107N/m2.In order to enhance the optical and mechanical property of Nb2O5 films, Nb2O5 films were deposited on K9 glass substrates using an e-beam gun evaporation with low energy oxygen ion assisted deposition (IAD) from an end-Hall ion source. Comparison of the optical and mechanical performance of the Nb2O5 films with IAD and without IAD was made. The results show that Nb2O5 films deposited with ion assist are much more profitable than those deposited without ion assist. The IAD increases the packing density of Nb2O5 films by 14%, hence the refractive index increases from 2.03 up to 2.18 and the adhesion rise from about 1×107 N/m2 to 129.7×107 N/m2.

关 键 词：Nb2O5薄膜 离子辅助沉积 聚集密度 附着力 

分 类 号：O484[理学—固体物理]