纳米压印光刻技术的研究  

Nanoimprint lithography technology

作　　者：张鸿海[1] 胡晓峰[1] 范细秋[1] 刘胜[1] 

机构地区：[1]华中科技大学机械科学与工程学院,湖北武汉430074

出　　处：《华中科技大学学报（自然科学版）》2004年第12期57-59,共3页Journal of Huazhong University of Science and Technology(Natural Science Edition)

基　　金：国家自然科学基金资助项目 (5 0 4 75 137)

摘　　要：研究了一种新型的纳米结构制作方法———纳米压印光刻技术 .该工艺通过阻蚀剂的物理变形而不是改变其化学特性来实现图形转移 ,其分辨率不受光波波长、物镜数值孔径等因素的限制 ,可突破传统光刻工艺的分辨率极限 .论述了热压雕版压印工艺及其设备 .实验表明 ,该工艺同时还具有高效率、低成本、大深宽比等优点 .This paper presented a method for manufacturing nano-structure-nanoimprint lithography. It created features by a mechanical deformation of the resist shape using a mold rather than by changing chemical properties of the resist. The lithography resolution was not limited by wavelength, numerical aperture and so on. Nanoimprint lithography was characterized by high efficiency, low cost and high aspect ratio. The process steps of Nanoimprint lithography and the machine developed by us were presented. Some experimental examples on fabricating micro/nano structures and devices were given such as nano-gratings, micro-hole arrays, micro-lens arrays and micro-fluidics channels etc.

关 键 词：纳米压印光刻 热压雕版压印 微器件制作 

分 类 号：TN29[电子电信—物理电子学]