ZnS薄膜脉冲激光沉积及其发光特性  

ZnS thin film deposited by pulsed lasers and its luminescent characteristic

作　　者：纠智先[1] 张兵临[1] 姚宁[1] 

机构地区：[1]郑州大学材料物理教育部重点实验室,郑州450052

出　　处：《激光技术》2004年第6期620-624,共5页Laser Technology

摘　　要：综述了ZnS的发光机制 ,脉冲激光沉积 (PLD)制备薄膜的原理、特点 ,分析了在用PLD制备ZnS过程中各主要沉积条件对成膜质量的影响 ,展望了ZnS薄膜的应用前景。Luminescent mechanism of ZnS and the preparation pri nc iple of thin film deposited by pulsed lasers and its chararacteristic are summar ized.The deposition parameters affecting the quality of the ZnS thin film during pulsed laser deposition are analysed emphatically.The prospect and potential ap plications of the film are also tentatively discussed.

关 键 词：脉冲激光沉积 ZNS薄膜 等离子体 纳米材料 

分 类 号：O484.4[理学—固体物理]