全息微光刻中全息掩模衍射特性的理论研究  

Theoretical Research on the Diffraction Property of Hologram Mask in Holographic Microlithography

作　　者：彭宗举[1] 陈芬[1] 周亚训[1] 马伯儒 张锦[2] 

机构地区：[1]宁波大学信息科学与工程学院,浙江宁波315211 [2]中国科学院光电技术研究所微细加工拍学技术国家重点实验室,四川成都610209

出　　处：《光电子技术与信息》2004年第6期67-71,共5页Optoelectronic Technology & Information

基　　金：国家自然科学基金资助(69776028)

摘　　要：通过耦合波理论分析,使用矩阵转换方法,对全息光刻中全息掩模衍射效率进行数值模拟计算,得出了影响全息掩模衍射特性的因素主要是显影前后记录材料平均介电常数的改变、介质的膨胀与收缩以及非共轭再现等,为实验研究提供了理论依据.Based on the analysis with coupled wave theory and using transfer matrix formalism, the numerical simulation of hologram mask diffraction efficiency in holographic lithography was presented. The result shows that the primary influences on the diffraction behavior of hologram mask stems are the reconstruction with wave front non-conjugation, the change of the average dielectric permittivity of recording material, and the swelling or shrinking of the medium between recording and reconstruction. The theoretical basis is provided for the experimental research.

关 键 词：全息光刻 耦合波理论 衍射特性 光刻技术 

分 类 号：TN305.7[电子电信—物理电子学]