反应溅射Ti-Al-Si-N纳米晶复合薄膜的微结构与力学性能  

Microstructure and mechanical properties of Ti-Al-Si-N nanocrystalline composite films prepared by the reactive sputtering method

作　　者：董云杉[1] 孔明[1] 胡晓萍[1] 李戈扬[1] 顾明元[1] 

机构地区：[1]上海交通大学金属基复合材料国家重点实验室,上海200030

出　　处：《功能材料》2005年第1期44-46,共3页Journal of Functional Materials

基　　金：上海市纳米专项基金资助项目(0352nm084)

摘　　要：采用 Ar、N2 和 SiH4 混合气体反应溅射制备了一系列不同 Si 含量的 Ti- Al- Si- N 薄膜,并采用EDS、AES、XRD、TEM和微力学探针研究了薄膜的微结构和力学性能。结果表明通过控制混合气体中SiH4 分压可以方便地获得不同 Si 含量的 Ti- Al -Si N纳米晶复合薄膜。当 Si 含量达到 3. 5% (原子分数)时,薄膜中出现 TiSix 界面相,造成(Ti,Al)N 晶粒细化,使薄膜力学性能得到提高,硬度和弹性模量的最高值分别为 36.0GPa和 400GPa。进一步提高 Si 含量,薄膜的力学性能逐渐降低。In this paper, Ti-Al-Si-N thin films were prepared with a mixture gas composed of argon, nitrogen and methane by the reactive sputtering method. EDS, AES, XRD, TEM and microindentor were employed to characterize their microstructures and mechanical properties. The results show that Ti-Al-Si-N nanocrystalline composite films different in silicon content can be conveniently prepared by controlling methane's partial pressure in the mixture gas. When silicon content reaches 3.5at%, new phase TiSix appears in thin films, which contributes to the fining of (Ti,Al)N grains and then causes enhancement of thin films' mechanical properties. At the same time, thin films hardness and elastic modulus reach their peak values respectively at 36.0 GPa and 400 GPa. Further increasing silicon content leads to decline of thin films' mechanical properties.

关 键 词：反应溅射 纳米晶复合薄膜 微结构 力学性能 

分 类 号：O484[理学—固体物理]