纳米多孔二氧化硅薄膜的制备与表征  

Preparation and characterization of nanoporous silica film

作　　者：王娟[1] 冯坚[1] 杨大祥[1] 张长瑞[1] 

机构地区：[1]国防科学技术大学航天与材料工程学院,湖南长沙410073

出　　处：《功能材料》2005年第1期54-56,共3页Journal of Functional Materials

基　　金：国防预研项目资助项目(41312040307)

摘　　要：以正硅酸乙酯为原料,采用酸/碱两步溶胶-凝胶法、结合匀胶和超临界干燥等工艺在硅片上成功制备了纳米多孔二氧化硅薄膜.适合匀胶的二氧化硅溶胶的粘度范围为9～15mPa·s;多孔二氧化硅薄膜表面均匀平整,其厚度为400～1000nm;折射率为1.09～1.24;介电常数为1.5～2.5.该多孔二氧化硅薄膜具有三维网络结构,二氧化硅微粒直径为10～20nm.Crack-free homogeneous nanoporous silica films on a silicon wafer have been synthesized via supercritical drying of wet gel films that were obtained by spin coating the polymeric silica sol, followed by aging in iso-propanol(IPA) solution. Polymeric silica sol was prepared using an acid/base two-step procedure with tetraethoxysilane (TEOS) as precursor. The optimized viscosity of silica sol for spinning coating was in the range of 9-15 mPa&middots. Thickness of the nanoporous silica films was 400-1000 nm; The refractive index was 1.09-1.24 and the dielectric constant was 1.5-2.5. The nanoporous silica films show three-dimensioned network, cross-linked by the primary particles with sizes of 10-20 nm.

关 键 词：纳米多孔二氧化硅薄膜 溶胶-凝胶 正硅酸 乙酯 低介电常数 

分 类 号：TB321[一般工业技术—材料科学与工程] TB383