声空化物理化学综合法制备发光多孔硅薄膜的微结构与发光特性  

The microstructure and characteristics of luminescent porous silicon film prepared by the physicochemical sonic-vacating method

作　　者：刘小兵[1] 史向华[1] 廖太长[2] 任鹏[3] 柳玥[4] 柳毅[4] 熊祖洪[5] 丁训民[4] 侯晓远[4] 

机构地区：[1]长沙理工大学物理与电子科学系,长沙410077 [2]湖南大学化学生物传感与计量学国家重点实验室 [3]长沙理工大学期刊中心,长沙410076 [4]复旦大学应用表面物理国家重点实验室,上海200433 [5]西南师范大学物理系,重庆400715

出　　处：《物理学报》2005年第1期416-421,共6页Acta Physica Sinica

基　　金：湖南省自然科学基金 (批准号 :0 4JJ3 0 3 0 );国家自然科学基金 (批准号:195 2 5 410 )资助的课题~~

摘　　要：声空化所引发的特殊的物理、化学环境为制备高效发光的多孔硅薄膜提供了一条重要的途径 .实验结果表明 ,声化学处理对于改善多孔硅的微结构 ,提高发光效率和发光稳定性都是一项非常有效的技术 .超声波加强阳极电化学腐蚀制备发光多孔硅薄膜 ,比目前通用的常规方法制备的样品显示出更优良的性质 .这种超声的化学效应源于声空化 ,即腐蚀液中气泡的形成、生长和急剧崩溃 ,在多孔硅的腐蚀过程中 ,孔中的氢气泡 ,由于超声波的作用增加了逸出比率和塌缩 ,有利于孔沿垂直方向的腐蚀 .The special physicochemical environment caused by sonic-vacating provides an important outlet for the preparation of highly efficient luminescent porous silicon films. Experimental results show that sonic-chemical treatment is an effective technology for the improvement of the microstructure of porous silicon, and the luminescent efficiency and stability thereof. Luminescent porous silicon films, prepared by ultrasonic-enhanced anode electrochemical etching, display better qualities than the samples prepared by conventionai methods widely used at present. This ultrasonic-chemical effect roots in sonic-vacating, i.e. the generation, formation and rapid collapse of bubbles in the etching solution. In the process of the porous silicon being etched, the escape rate and caving-in of hydrogen bubbles in the pores is increased as a result of the work of the ultrasonic waves, which is helpful to the vertical etching of the pores.

关 键 词：声空化物理 多孔硅 发光特性 塌缩 氢气泡 微结构 声化学 硅薄膜 发光效率 腐蚀液 

分 类 号：O484[理学—固体物理]