彩色膜上ITO的室温沉积及其在FPD中的应用  

Room Temperature Deposition of Thin-film Indium-tin Oxide on Micro-fabricated Color Filters and Its Application to Flat-panel Displays

作　　者：孟志国[1] 彭华君[2] 吴春亚[1] 李娟[1] 熊绍珍[1] 丘成峰[2] 李娟娟[2] 王文[2] 郭海成[2] 

机构地区：[1]南开大学光电子所,天津300071 [2]香港科技大学电机电子工程系

出　　处：《光电子．激光》2005年第2期140-145,共6页Journal of Optoelectronics·Laser

基　　金：国家"863"计划资助项目(2002AA303261);国家自然科学基金资助项目(60077011;69907002);天津市自然科学基金资助项目(023602011)

摘　　要：使用直流磁控溅射技术,在彩色膜衬底上室温制备出粘附性良好的氧化铟锡(ITO)透明导电薄膜。X光衍射(XRD)和原子力显微(AFM)分析表明,室温ITO为多晶态,薄膜具有很好的透过率和良好的导电特性,方块电阻为120Ω/□,对应ITO/彩色膜复合膜在450nm的蓝(B)光、530nm的绿(G)光、630nm的红(R)光处的峰值透过率均达到85%左右。彩色膜与ITO电极的形成及联接等加工工艺有良好的相容性。对该技术在彩色液晶显示(LCD)和彩色有机发光显示(OLED)中的应用,进行了探索。Direct deposition of indium-tin oxide (ITO) thin film on color filter is of practical use in the construction of advanced flat-panel display. Room-temperature DC magnetron sputtering of thin-film ITO and issues related to the integration of such ITO on glass panel containing micro-fabricated color filters (CFs) and other functional materials have been investigated. The resulting polycrystalline ITO exhibit good adhesion to the underlying CFs, as well as good optical transparency and high electrical conductivity, the sheet resistance of ITO on CFs is about 120 Ω/, and the transmittance is higher than 85% at wavelengths of 450 nm (B), 530 nm (G) and 630 nm (R). Application of this ITO deposition technology to color liquid-crystal displays (LCD) and organic light-emitting displays (OLED) were also presented.

关 键 词：ITO 彩色膜 FPD 方块电阻 有机发光显示 OLED 氧化铟锡 透过率 室温 透明导电薄膜 

分 类 号：TN304[电子电信—物理电子学] TN873