LiNbO_3衬底上电子束蒸发集成光学钛薄膜  

Integrated Optic Titanium Thin Films Deposited by Electron Beam Evaporation on LiNbO_3 Substrate

作　　者：罗江财[1] 王剑格 

机构地区：[1]重庆光电技术研究所

出　　处：《半导体光电》1994年第2期163-166,174,共5页Semiconductor Optoelectronics

摘　　要：钛扩散铌酸锂（Ｔｉ－ＬｉＮｂＯ３）光波导是最基本的集成光学器件之一。文章报道了在ＬｉＮｂＯ３衬底上，用自动电子束蒸发技术淀积Ｔｉ薄膜。对各种淀积条件下的结果测试分析表明：用０．５～１．１ｎｍ／ｓ的淀积速率和２．７×１０－４Ｐａ以下的残余气压，可以得到较好的Ｔｉ薄膜。用这种Ｔｉ薄膜已研制出了光波导、薄膜偏振器、相位调制器、光开关、光耦合器和光纤陀螺芯片等集成光学器件。Titanium diffused LiNbO3 (Ti-LiNbO3)optical waveguide is one of the basic integrated optic devices.In this paper,Ti thin films prepared on the LiNbO3 substrate by automatic electron beam evaporation technique are reported. The reaults obtained from various deposition conditions are measured and analysed which shows that better Ti thin films can be obtained a deposition rate of 0.5～1.0 nm/s and residual air pressure of less than 2. 7×10-4 Pa. Some integrated optic devices have been developed by using Ti thin films, such as optical waveguide, thin film waveguide polarizer, phase modulator, optical switch, optical coupler and optical fiber gyroscope component.

关 键 词：集成光学器件 电子束蒸发 钛 薄膜 

分 类 号：TN256[电子电信—物理电子学]