微波等离子体CVD金刚石薄膜的显微结构  

Microstructure of Diamond Thin Films by Microwave Plasma CVD

作　　者：袁逸[1] 杨保雄[1] 白元强[1] 王建军[1] 吕反修[1] 

机构地区：[1]北京科技大学材料科学与工程系

出　　处：《北京科技大学学报》1994年第3期245-249,共5页Journal of University of Science and Technology Beijing

基　　金：技术新材料专家委历会资助

摘　　要：用扫描电镜（ＳＥＭ）和透射电镜（ＴＥＭ）对６种微波等离子体ＣＶＤ金刚石薄膜的表面形态和显微结构进行了研究．结果表明：在金刚石晶粒长大过程中，（１１１）面方向长大时产生密度很高的微孪晶缺陷，而（１００）面方向长大时产生的晶体缺陷较少．The morphology and the microstructure of six different dianond films deposited by microwave plasma CVD have been studied by SEM and TEM.The observations of microstructure indicate that high dencity microtwins are formed during the(111)planes growth and a few of crystal defects are formed during the(100) planes growth.

关 键 词：金刚石 薄膜 显微结构 MPCVD 

分 类 号：O484.1[理学—固体物理]