用FTMS方法原位制备Yba_2Cu_3O_（7－δ）薄膜气压和位置相关性研究  

CO-EFFECT OF PRESSURE AND POSITION ON IN SITU Yba_2Cu_3O_(7-б) FILM PREPARATION BY FACING TARGET MAGNETRON SPUTTERING

作　　者：曾宪庭[1] 凌兆兴[1] 黄康权[1] 

机构地区：[1]华中理工大学物理系,香港中文大学物理系

出　　处：《低温物理学报》1994年第5期363-367,共5页Low Temperature Physical Letters

摘　　要：本文用双靶相对磁控溅射法（ＦＴＭＳ）在１．２Ｐａ至２６．６Ｐａ气压范围原位制备高温超导ＹＢａ２Ｃｕ３Ｏ７－б薄膜，重点研究了溅射气压和功率与双靶间距和衬底位置之间的相关性．结果表明，为制备高质量超导薄膜，在不同的溅射气压下，存在不同的靶一衬底最佳几何配置，溅射薄膜的组分、性能和溅射粒子的空间分布亦取决于这些参数的选取．Abstract YBa2Cu3O7-бHigh Tc superconducting films have been prepared at the pressure ranged from 1. 2Pa to 26. 6Pa by FTMS method. The co-effect of the pressure and position of the targets and substrate was studied. The results showed the optimal position of the targets and substrate was re lated to the total gas pressure and O2 partisl pressure. Some explanation about this effect have been given. The influence of discharge power on the film composition was also discussed.

关 键 词：超导膜 YBCO 制备 磁控溅射 气压 

分 类 号：O511.1[理学—低温物理]