溅射氧化镍薄膜的电致变色特性  

The Electrochromic Properities of NiO Sputtered Films

作　　者：潘素瑛[1] 毛骏 

机构地区：[1]武汉工业大学材料研究与测试中心

出　　处：《功能材料》1994年第5期397-401,411,共6页Journal of Functional Materials

摘　　要：本文采用直流反应溅射获得了具有良好电色特性的ＮｉＯｘ薄膜。薄膜的电色特性强烈地受到制备条件的影响，在低溅射电压和高溅射压力下制得的薄膜电色效果最佳。典型的ＮｉＯｘ电色薄膜厚２００ｎｍ，可见光透过率变化范围在６３２．８ｎｍ处可达４８％，着色及退色响应时间为５～１０ｓ。Ｘ射线衍射表明薄膜呈非晶态。ＸＰＳ显示Ｎｉ￣（３＋）在电色过程中起着色心作用。红外反射谱证实电色过程有ＯＨ基的参与。Nickel oxide films were made byreactive DC sputtering.Subsequent electrochemicaltreatment in NaOH established electrochromism.The experimental results show that theelectrochromic properties of nickel oxide films arestrongly dependent on the deposition conditions.Atypical film has a solar transmittance of 0.72 in theHeached state and 0. 24 in colored state. Films canbe fully colored in 10s and fully bleached in 5s at+1. 2V and-1. 2V respectively.X-ray diffractionshowed that the films were in an amorphous phaseand XPS studies identified that Ni￣(3+) acts as colorcentres.Infrared reflectance measurements showedunambiguous absorption due to OH strechingVibration,and It was found that bleached state was associated with 'free'OH.

关 键 词：电致变色 氧化镍薄膜 反应溅射 变色材料 

分 类 号：O484.41[理学—固体物理] TB39[理学—物理]