厚二氧化硅光波导薄膜的制备  

Fabrication of Thick Silica Film for Optical Waveguides

作　　者：包洪涛[1] 戴基智[1] 杨亚培[1] 赵天卓[1] 佟会[1] 罗辉[1] 

机构地区：[1]电子科技大学光电信息学院,成都610054

出　　处：《激光与光电子学进展》2005年第5期48-50,55,共4页Laser & Optoelectronics Progress

摘　　要：随着光通信的飞速发展,Si基SiO2平面光波导集成器件的应用更加重要和广泛。在Si基上制备高质量的厚SiO2 薄膜,是制作SiO2光波导及其集成器件的基础。本文介绍了Si基厚SiO2薄膜的几种制备方法。With the development of optical communications integrated devices on silicon-based silica planar optical waveguides have been widely used and play an important role in optical communications. Depositing high quality thick SiO2 film on Si substrate is the basis for fabricating waveguides and integrated devices. Some fabrication methods of thick SiO2 film are described

关 键 词：光波导薄膜 二氧化硅 SIO2薄膜 集成器件 平面光波导 SI基 制备方法 光通信 

分 类 号：TN2[电子电信—物理电子学] TQ127.2[化学工程—无机化工]