用完全非共振光驻波聚焦原子制作纳米结构分析  

Analysis of atom focusing for nanostructure fabrication with a completely off-resonant optical standing wave

作　　者：陈献忠[1] 姚汉民[1] 陈旭南[1] 

机构地区：[1]中国科学院光电技术研究所微细加工光学技术国家重点实验室,成都610209

出　　处：《物理学报》2005年第6期2645-2652,共8页Acta Physica Sinica

基　　金：中国科学院知识创新工程项目(批准号:A2K0009);开放基金资助的课题.~~

摘　　要：用完全非共振激光驻波场对热原子束实现纳米量级的聚焦,可以降低原子光刻试验的难度.用蒙特卡罗算法和轨迹模拟法分析原子源对原子聚焦的影响,结果表明靶的有效尺寸对纳米图形线宽的影响远大于原子束的发散角和原子的纵向速度分布.提出几种改进试验的方法.The focusing of a thermal atomic beam to nanometer-scale dimensions can be realized by a completely off-resonant standing-wave laser field, which can decrease the difficulty of atom lithography experiments. The effects of atom source on atom focusing are analyzed using the Monte-Carlo scheme and trajectory tracing method, and the simulation results have shown that the effective size of the target has a much more important effect on feature width than beam spread and longitudinal velocity spread. Several methods for improving experiments are presented.

关 键 词：完全非共振激光驻波场 原子聚焦 纳米结构制作 原子光刻试验 

分 类 号：O562.2[理学—原子与分子物理]