电子辅助热丝化学气相沉积金刚石薄膜中氢原子谱线与最佳成膜条件  

Atomic Hydrogen Emission Line and the Optimum Experimental Condition for Diamond Film Deposited by EACVD

作　　者：董丽芳[1] 尚勇[1] 王志军[1] 

机构地区：[1]河北大学物理科学与技术学院,保定071002

出　　处：《人工晶体学报》2005年第3期550-552,530,共4页Journal of Synthetic Crystals

基　　金：河北省自然科学基金重点项目(No.502121)

摘　　要：采用蒙特卡罗方法,对以CH4/H2混合气体为源气体的EACVD中的氢原子发射过程进行了模拟。研究了不同实验条件下产生的H、CH3的数目与氢原子谱线相对强度的关系,给出了一种利用氢原子谱线来获得最佳成膜实验条件的方法。本工作对于有效控制工艺条件,生长出高质量的金刚石薄膜具有重要意义。The process of atomic hydrogen emission in EACVD in CH4/H2 gas mixture is simulated by Monte Carlo method. The relationship between the number of H, CH3 and the ratio of atomic hydrogen emission line intensity under different experimental conditions was investigated. A method of gaining the optimum experimental condition for diamond film deposition by the atomic hydrogen emission line is given. The result is of great importance to depositing high quality diamond films by controlling the conditions of technology efficiently.

关 键 词：金刚石薄膜 化学气相沉积 氢原子发射谱线 最佳成膜条件 

分 类 号：O484[理学—固体物理]