Ti-Si-N复合膜的界面相研究  

A study on interfacial phase of Ti-Si-N composite films

作　　者：孔明[1] 胡晓萍[2] 董云杉[1] 李戈扬[1] 顾明元[1] 

机构地区：[1]上海交通大学金属基复合材料国家重点实验室,上海200030 [2]上海大学材料科学与工程学院,上海200072

出　　处：《物理学报》2005年第8期3774-3779,共6页Acta Physica Sinica

基　　金：上海市纳米技术专项基金(批准号:0352nm084)资助的课题.~~

摘　　要：为了揭示Ti_Si_N复合膜中Si3N4界面相的存在方式及其对薄膜力学性能的影响,采用x射线衍射仪、高分辨透射电子显微镜、俄歇电子能谱仪和显微硬度仪对比研究了磁控溅射Ti_Si_N复合膜和TiN/Si3N4多层膜的微结构和力学性能.实验结果表明,Ti_Si_N复合膜均形成了Si3N4界面相包裹TiN纳米晶粒的微结构.其中低Si含量的Ti_Si_N复合膜中Si3N4界面相的厚度小于1nm,且以晶体态存在,薄膜呈现高硬度.而高Si含量的Ti_Si_N复合膜中的Si3N4界面相以非晶态存在,薄膜的硬度也相应降低.显然,Ti_Si_N复合膜中Si3N4界面相以晶体态形式存在是薄膜获得高硬度的重要微结构特征,其强化机制可能与多层膜的超硬效应是相同的.To reveal the interfacial phase structure and its effect on mechanical properties of Ti-Si-N composite films, x-ray diffractometry, high-resolution transmission electron microscopy, Auger electron spectroscopy, and microhardness tester were employed to investigate the interfacial phase structure and mechanical properties of magnetron sputtered Ti-Si-N composite films. A series of TiN/Si3N4 multilayered films in nanometer scale were also prepared and characterized for comparison. The results indicated that Ti-Si-N composite films formed a structure of nanocrystalline TiN surrounded by Si3N4 interfacial phase. In the Ti-Si-N composite film with lower silicon content, the Si3N4 interfacial phase with a thickness of less than 1 nm crystallized and formed a coherent interface with TiN nanocrystals, leading to an enhancement in the hardness of the film. Whereas, in the composite film of larger silicon content, Si3N4 phase existed as amorphous and resulted in a decrease in hardness. Our research indicated that the crystallization of Si3N4 interfacial phase was essential to obtain a high hardness in the Ti-Si-N composite films, and the strengthening mechanism of the composite films appeared to be the same as TiN/Si3N4 multilayered films.

关 键 词：TI-SI-N 复合膜 界面相 高分辨透射电子显微镜 Si3N4 俄歇电子能谱仪 X射线衍射仪 力学性能 显微硬度仪 微结构特征 存在方式 磁控溅射 对比研究 纳米晶粒 超硬效应 强化机制 多层膜 TiN 高硬度 薄膜 非晶态 含量 体态 

分 类 号：O484[理学—固体物理]