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机构地区:[1]武汉大学资源与环境科学学院,武汉430072
出 处:《中国腐蚀与防护学报》2005年第4期245-249,共5页Journal of Chinese Society For Corrosion and Protection
基 金:国家自然科学基金面上项目(50271049)
摘 要:采用无氰化学镀工艺,研制出一种导电性良好的镀银铜粉,粉末体积电阻率小于2×10-4Ω·cm,用该粉末为填料制成的导电胶,导电率高(导电填料与树脂的重量比为75:25时,体积电阻率为5×10-4Ω·cm)、抗迁移能力强(比银粉导电胶提高近百倍)、导电稳定(经60℃相对湿度100%湿热试验1000h,体积电阻率升高小于20%).采用粉末微电极技术研究了导电胶抗迁移的机理,结果表明电偶效应是该导电胶具有抗迁移作用的主要原因,铜作为阳极抑制作为阴极的银的溶解,从而降低银形成枝晶的几率.One new kind of silver-plated copper powder with high conductivity (volume resistivity of the powder is less than 2×10^-4Ω·cm) was developed by the eleetroless plating without cyanide. The ECAs filled with this silver-plated copper powder exhibit high conductivity ( the volume resistivity of ECAs is less than 5×10^-4Ω·cm when the mixing proportion of the resin to powder is 25:75 by weight) , high migration-resistance (the shortcut time is 100 time longer than silver-filled ECAs in the migration test) and high electric conductive stability (the volume resistivity increase is not more than 20% after 1000 hours humid-heat test in the condition of 60℃ and RH100% ). The mechanism of anti-migration was studied using powder mieroelectrode technique and other electrochemical methods. The results show galvanic coupling effect plays an important role in the anti-migration. Copper as anode restrains cathodic silver dissolved during dissolution then decreases the probability of dendritic growth.
分 类 号:TG172[金属学及工艺—金属表面处理]
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