对向靶溅射制备NiCr-NiSi薄膜热电偶的动态特性研究  

AN INVESTIGATION ON THE DYNAMIC CHARACTERISTIC OF NiCr-NiSi THIN FILM THERMOCOUPLE PREPARED BY FACING TARGETS SPUTTERING

作　　者：刘裕光[1] 姜恩永[1] 刘明升 程启[1] 

机构地区：[1]天津大学应用物理系,天津300072

出　　处：《真空科学与技术》1995年第5期317-320,共4页Vacuum Science and Technology

摘　　要：用对向靶溅射制备NiCr－NiSi薄膜热电偶，实现了薄膜成分与靶材基本一致。对热电偶进行动态特性测试表明，薄膜热电偶的时间常数τ随膜厚变薄而减小，并对此进行讨论。In this paper,NiCr-NiSi thin film thermocouples prepared by facing targets sputtering were presented. By this method,little deviation of composition between film and target was achieved. The measurements of dynamic characteristic of the thermocouple show that the time-constant τ of the thermocouple increases as a function of the film thickness. This experimental result was discussed in the paper.

关 键 词：对向靶溅射 薄膜热电偶 时间常数 

分 类 号：TN105.1[电子电信—物理电子学] TN305.92