具有定向及自控制功能的真空镀膜系统  

Vacuum deposition system with directionalism and autocontrol functions

作　　者：徐仁军[1] 贺天民[1] 王魁香[1] 

机构地区：[1]吉林大学物理学院,吉林长春130023

出　　处：《物理实验》2005年第9期45-47,共3页Physics Experimentation

摘　　要：对现有真空镀膜系统进行了改进,在原系统中增加了定向装置和5个控制装置,可实现定向镀膜和有效地控制膜厚,进而显著提高膜层质量.A common vacuum deposition system is improved that a directional device and five autocontrol devices are equipped, so that the directional deposition and the effective control of film thickness can be achieved. Thus the quality of deposition film is remarkably enhanced.

关 键 词：真空镀膜 自动控制 膜厚 

分 类 号：TB75[一般工业技术—真空技术]