激光烧蚀过程中密度交叠区振荡稳定时间与晶粒尺寸均匀性的关系  

Relation Between Size-uniformity of Si Nanoparticles and Oscillating Stabilization Time of the Mixed Region During Laser Ablation

作　　者：李艳丽[1] 刘景旺[2] 张荣梅[3] 王英龙[1] 

机构地区：[1]河北大学物理科学与技术学院,河北保定071002 [2]北华航天工业学院基础部,河北廊坊065000 [3]保定师范专科学校物理系,河北保定071000

出　　处：《河北大学学报（自然科学版）》2005年第5期478-481,共4页Journal of Hebei University(Natural Science Edition)

基　　金：河北省自然科学基金资助项目(E2005000129500084)

摘　　要：在不同环境气体中,对脉冲激光烧蚀产生的Si粒子的输运过程进行了Monte Carlo动力学模拟,并实验研究了脉冲激光烧蚀制备纳米Si薄膜的晶粒尺寸分布.在理论分析和实验研究的基础上,讨论了纳米Si晶粒尺寸分布和烧蚀过程中出现的交叠区振荡稳定时间的对应关系.结果表明,Si蒸气/环境气体高密度交叠区振荡稳定时间越短,所制备的纳米Si晶粒尺寸分布越均匀.In different ambient gases, the transport process of Si particles produced by pulsed laser ablation （PLA） is simulated by using Monte Carlo method, which shows that a high density mixed region （MR） of Si vapor and ambient gas appears, and its position oscillates between target and substrate. The size distribution of Si nanoparticles in the film is researched experimentally. And then, the relation between the size distribution of Si nanoparticles and the oscillating stabilization time of the MR is discussed. The results show that the shorter the oscillating stabilization time of the MR is, the more uniform the as-formed nanoparticles in size are.

关 键 词：脉冲激光烧蚀 动力学 纳米SI晶粒 尺寸分布 

分 类 号：O78[理学—晶体学]