EACVD中的H_α谱线与最佳生长条件  

H_α Line and the Optimum Experimental Condition for Diamond Deposition in EACVD

作　　者：董丽芳[1] 王志军[1] 尚勇[1] 

机构地区：[1]河北大学物理科学与技术学院,河北保定071002

出　　处：《光谱学与光谱分析》2005年第10期1545-1547,共3页Spectroscopy and Spectral Analysis

基　　金：河北省自然科学基金(502121)项目资助

摘　　要：采用蒙特卡罗方法,模拟了CH4/H2混合气体为源气体的EACVD中的氢原子发射过程。考虑了电子与H2的弹性碰撞及振动激发、分解、电子激发、相应于Hα,Hβ,Hγ谱线的激发、电离及分解电离等非弹性碰撞过程;与CH4的碰撞考虑了弹性动量传输及振动激发、分解、电子激发、电离及分解电离等非弹性碰撞过程。研究了不同实验条件下产生的H,CH3的数目与Hδ谱线强度的关系,给出了一种通过Hα谱线来推断生长金刚石薄膜的最佳实验条件的方法。The process of atomic hydrogen emission in the CH4/H2 gas mixture in EACVD was simulated by Monte Carlo method. In the simulation the collision between electron and H2 molecule has two basic types： elastic collision and inelastic collision. Four types of inelastic processes have been considered, namely vibrational excitation, dissociation, electron excitations and ionization. For e-CH4 collision, elastic momentum transfer, vibrational excitation, dissociation, ionization, and dissociation ionization were considered. The relationship between the numbers of H, and CH3, and the atomic hydrogen emission line intensity under different experimental conditions was investigated. A method of extrapolating the optimum experimental condition for diamond deposition by the atomic hydrogen emission line is given. The result is of great importance to depositing high quality diamond films by controlling the conditions of technology efficiently.

关 键 词：化学气相沉积 氢原子发射谱线 最佳实验条件 

分 类 号：O539[理学—等离子体物理]