飞秒激光作用下全向高反膜破坏的激发过程  

Ultrafast electronic dynamics during femtosecond laser-induceddamage in omnidirectional reflector

作　　者：孙海轶[1] 贾天卿[1] 李晓溪[1] 徐世珍[1] 冯东海[1] 李成斌[1] 王晓峰[1] 徐至展[1] 

机构地区：[1]中国科学院上海光学精密机械研究所强场激光物理国家重点实验室,上海201800

出　　处：《物理学报》2005年第10期4736-4740,共5页Acta Physica Sinica

基　　金：国家自然科学基金(批准号:60108002)资助的课题.~~

摘　　要：设计和制备了全向高反膜SiO2/TiO2,研究了它在不同脉冲宽度、不同脉冲能量的飞秒激光作用下的破坏阈值和烧蚀深度.利用发展的抽运-探针方法,研究了抽运脉冲作用下材料中导带电子的超快激发和能量沉积过程,建立并求解了飞秒激光激发材料和材料的激发对抽运光自身反作用的耦合动力学模型.模型较好地揭示了材料破坏的激发过程.The omnidirectional reflector SiO2/TiO2 is prepared and its threshold fluences and ablation depths at different pulse durations and fluences is studied. In addition a new pump and probe experiment system is developed. The probe pulse is kept as short as possible, while, the pump pulse is stretched and its duration is much longer than that of the probe pulse. Time-reselved excitation processes and damage mechanisms in omnidirectional reflector SiO2/TiO2 is studied. A coupled dynamic model, not only considering the excitation of the material by the laser, but also the counteraction of this excitation to the laser, is employed to study the damage mechanisms. This model well explains the excitation processes during the damage of omnidirectional reflector.

关 键 词：飞秒激光 全向高反膜 激发过程 破坏机制 激光作用 高反膜 耦合动力学模型 材料破坏 脉冲能量 抽运光 

分 类 号：TN249[电子电信—物理电子学]