磁控反应溅射法制备渐变折射率薄膜的模型分析  

Modeling analysis of gradient-index coatings prepared by reactive magnetron sputtering

作　　者：沈自才[1] 邵建达[1] 王英剑[1] 范正修[1] 

机构地区：[1]中国科学院上海光学精密机械研究所

出　　处：《物理学报》2005年第10期4842-4845,共4页Acta Physica Sinica

摘　　要：阐述了磁控反应溅射法制备渐变折射率薄膜的机理;探讨了磁控反应溅射法制备渐变折射率薄膜的理论模型,给出了渐变折射率薄膜的折射率与反应气体分压的关系,在一定的沉积参数下,由要得到的膜层折射率随膜层几何厚度的变化规律可推导出反应气体分压比随时间的变化规律;最后以制备折射率线性变化的薄膜为例说明了如何推导得到反应气体分压比随时间的变化规律.The formation mechanism of gradient-index coatings by reactive magnetron sputtering is discussed. A practical modeling of gradient-index coatings is proposed, the relationship between refractive index of coatings and pressure of reactive gas is established. Next, we discussed the changing rule of partial-pressure of reactive gas with time requivcd for obtaining a desired refractive index of gradient coatings under specific deposition conditions. A linear coating is taken as example to illustrate how to get the relationship between partial-pressure of reactive gas and time.

关 键 词：渐变折射率 磁控反应溅射 模型 反应溅射法 薄膜 制备 模型分析 磁控 变化规律 反应气体 

分 类 号：O484.43[理学—固体物理]