磁控溅射制备掺银TiO_2薄膜的光催化特性研究  

Study on Photocatalytic Properties of Ag-doped TiO_2 Thin Film by AC Magnetic Control Sputtering Method

作　　者：邱成军[1] 曹茂盛[2] 张辉军[1] 刘红梅[1] 田风军[1] 刘鑫[1] 

机构地区：[1]黑龙江大学集成电路重点实验室,哈尔滨150080 [2]北京理工大学材料科学与工程学院,北京100081

出　　处：《材料工程》2005年第10期35-37,46,共4页Journal of Materials Engineering

基　　金：黑龙江省教育厅计划资助项目(10531129)

摘　　要：利用交流磁控溅射设备采用金属Ti靶在石英和硅衬底制备掺银TiO2薄膜,并利用SEM,XRD及吸收光谱等方法分析测试TiO2薄膜的性质,探讨了掺银对TiO2薄膜吸收光谱的影响。并通过对甲基橙溶液浓度变化研究了掺银TiO2薄膜光催化特性,分析了掺银对TiO2薄膜增强光催化作用的工作机理,研究结果表明掺银有利于TiO2薄膜对有机物的降解作用。Ag-doped TiO2 thin film was prepared based on silicon substrate with Ti as the target by magnetic control sputtering equipment, characterized by SEM,XRD and absorption spectrum and the effect of doped Ag on absorption spectrum of TiO2 thin film was discussed. Photocatalytic properties of Ag-doped TiO2 thin film were investigated by the concentration change of methyl orange and the operation mechanism of photocatalytic enhancement of Ag-doped TiO2 thin film was analyzed. The results showed that doped Ag was propitious to the organics degradation of TiO2 thin film.

关 键 词：薄膜 锐钛矿相 射频磁控溅射 光催化活性 

分 类 号：TQ134.17[化学工程—无机化工]