连续型平面衍射聚光透镜掩模的制作  

Fabrication of continuous relief mask for diffractive plane focus lens

作　　者：王多书[1] 罗崇泰[1] 刘宏开[1] 马勉军[1] 黄良甫[1] 

机构地区：[1]兰州物理研究所,甘肃兰州730000

出　　处：《应用光学》2005年第6期77-80,共4页Journal of Applied Optics

摘　　要：针对目前二元光学元件掩模制作工艺过程的诸多不足,对连续型平面衍射聚光透镜掩模的激光直写制作工艺进行了研究。基于基尔霍夫标量衍射理论,采用光线追迹法设计了连续型平面衍射聚光透镜掩模。采用激光直写技术,利用CLW S-300M/C极坐标激光直写设备、S1830光刻胶和M ICROPO S IT-351显影液,进行了刻写实验。实验表明,激光能量、预烘烤温度、显影液浓度以及预曝光对掩模微结构的制作均有影响。最后制作了掩模。与二元光学元件掩模的制作工艺相比,该技术具有工艺简单、制作周期短且易于操作的优点。The fabrication technology of continuous relief mask for diffractive plane focus lens is studied in the paper. According to Kirchhoff＇s scalar diffraction theory, with the ray tracing method, a continuous relief mask for diffractive focus lens has been designed. Using the technology, some experiments on the writing of the mask were carried out with the help of CLWS-300M/C. The results show that the laser energy, prebake temperature, developer concentration and pre-exposure will affect the microstructure of the mask. The mask was fabricated with such technology after a lot of efforts. Compared with the technology for binary optical mask, the technology has the following strong points： process simplification, short period of fabrication and easy operation.

关 键 词：掩模 聚光透镜 平面衍射 激光直写技术 

分 类 号：TH74[机械工程—光学工程]