氮化硼薄膜制备技术研究进展  

Progress in Study on Preparation of Boron Nitride Film

作　　者：贾铁昆[1] 王为民[1] 

机构地区：[1]武汉理工大学材料复合新技术国家重点实验室,武汉430070

出　　处：《材料导报》2005年第F11期290-292,共3页Materials Reports

基　　金：国家自然科学基金（50372047）

摘　　要：简述了氮化硼的优异性能和广阔的应用前景，概述了氮化硼薄膜的制备方法，分析了薄膜制备过程中的影响因素，最后对氮化硼薄膜今后的研究方向提出展望。The excellent properties and the wide application of boron nitride are described in brief in this paper, and some methods of preparation of boron nitride film are summarized. An analysis is made of the deposition factors which have an impact on the film in the process. The development on boron nitride film in the future is pointed out.

关 键 词：氮化硼 薄膜 等离子体 物理气相沉积 化学气相沉积 

分 类 号：O484.1[理学—固体物理]