X射线用Kirkpatrick-Baez显微镜成像质量的研究  

Image quality with Kirkpatrick-Baez microscope in hard X-ray

作　　者：潘宁宁[1] 王占山[1] 顾春时[1] 秦树基[1] 陈玲燕[1] 

机构地区：[1]同济大学物理系,上海200092

出　　处：《强激光与粒子束》2006年第1期61-65,共5页High Power Laser and Particle Beams

基　　金：国家863计划项目资助课题

摘　　要：对惯性约束聚变的一种重要诊断方法——Kirkpatrick-Baez型结构显微镜成像方法进行了研究。计算了Kirkpatrick-Baez型结构显微镜的主要像差．并分析得出：造成轴上点像差的主要因素是球差，占像差的94％。基于光线追迹方法模拟出这种结构的成像过程，比较了不同反射镜长随视场变化对物面分辨率的影响，发现为了保证物面的空间分辨率能达到ICF研究要求视场应尽量控制在200μm以内。最终得出能量在8keV、视场为200μm，分辨率小于10μm的Kirkpatrick-Baez型结构的模型。提出在装凋过程中重要公差计算方法，得到数值孔径为0．0037时，角度装调公差应在-0．087°～0．067°范围内。An important diagnosis method Kirkpatriek-Baez microscope system in ICF experiments was researched. The brief aberration of the Kirkpatrick-Baez microscope was calculated. The main aberration, spherical aberration was analyzed, and the spherical aberration is 94% of the total aberration. The configuration was simulated by the ray tracing method. Resolutions in different fields and mirror-lengths were compared. The modal of Kirkpatrlck-Baez microscope was made in computer with 10μm resolution at 8 keV. It was studied about the adjusting tolerance method of Kirkpatrick-Baez microscope. When numerical aperture is 0.003 7, the angle error range is -0. 087°-0. 067°.

关 键 词：掠入射成像系统 X射线 光线追迹 空间分辨率 角度公差 

分 类 号：TL651[核科学技术—核技术及应用]