高能等离子体辅助CVD法新型纳米碳膜的制备及分析  

Investigation of a new type nano carbon film prepared by high energy plasma assisted CVD

作　　者：杨武保[1] 范松华[2] 戈敏[3] 张谷令[2] 沈曾民[3] 杨思泽[2] 

机构地区：[1]中国石油大学机电学院,北京102249 [2]中国科学院物理研究所,北京100080 [3]北京化工大学碳纤维研究所,北京100029

出　　处：《物理学报》2006年第1期351-356,共6页Acta Physica Sinica

基　　金：国家自然科学基金(批准号:50071068)资助的课题~~

摘　　要：利用自制高能等离子体辅助化学气相沉积设备在1Cr18Ni9Ti衬底上,在离子能量2keV、工作压力2Pa、工作气氛为CH4/H2=10%的工艺条件下得到了一种硬度高、导电性能良好、可能具有碳链结构的新型碳膜.工艺研究结果表明,衬底材料对制备该新型纳米碳膜具有关键作用,离子能量、工作压力及气氛等工艺因素也具有重要作用.原子力显微镜分析结果表明,该薄膜晶粒尺寸小于100nm,薄膜光滑、致密、均匀.拉曼光谱分析显示,该薄膜的拉曼光谱特征为中心峰在1580cm-1附近、显著宽化的单一峰.欧姆计测量表明该薄膜的薄膜电阻为1·6×104Ω/cm2.利用纳米力学探针测得该纳米碳膜的显微硬度为21·38GPa,体弹性模量为420·65GPa.Using self-fabricated equipment, new type carbon films with unfamiliar properties, high hardness and good electric conductivity were deposited on 1Cr18Ni9Ti substrate under deposition parameters of ion energy 2keV, pressure 2Pa, and methane ratio in hydrogen 10%. Process review shows that the substrate material is the key factor for the carbon fihns deposition, and the parameters of ion energy, pressure and methane ratio are impotent also. The grain size is less than 100nm and the film is smooth, dense and uniform as tested by AFM. Raman spectra show that there is only one broaden peak around 1580cm^- 1 . The sheet resistance of the film is 1.6 × 10^4Ω/cm^2 as measured with the ohmmeter. The micro-hardness of the film is 21.38GPa and the bulk elasticity is 420.65GPa as tested by nano-indenter. It is concluded that there may be carbon chain structure in this film.

关 键 词：高能等离子体 CVD法 纳米碳膜 衬底材料 

分 类 号：TB383.1[一般工业技术—材料科学与工程]