MEVVA放电在材料表面改性上的应用  

APPLICATION OF MEVVADISCHARGE TO MATERIAL SURFACE MODIFICATION

作　　者：高玉[1] 耿漫[1] 黄遇明 龚晓荣 于毅军 唐德礼[1] 铁军[1] 

机构地区：[1]核工业西南物理研究院

出　　处：《核聚变与等离子体物理》1996年第1期31-35,共5页Nuclear Fusion and Plasma Physics

摘　　要：本文描述了金属蒸发真空弧（ＭＥＶＶＡ）放电的特点、阴极弧等离子体的形成过程．以及与加热蒸发电离方式相比ＭＥＶＶＡ放电的优越性。文章还叙述了建造的ＭＥＶＶＡ离子源的实用参数、工作过程及ＭＥＶＶＡ等离子体源在全方位离子注入装置中的应用。This paper describes some characteristics of the MEVVA discharge.the process of generating a cathode-arc plasma and the advantages of the MEVVA discharge compared with thekind of heating-vaporing-ionizing source.Some practical parameters and the operating process of the MEVVA ion source as well as a plasma source with MEVVA discharge used in aPSII device are presented. Various plasmas having good-quality and high-performance areobtained with MEVVA discharges and have been widely used in sight-line processing andomnibearing ion implantation for material surface modification.

关 键 词：等离子体源 材料表面改性 阴极弧放电 

分 类 号：O531[理学—等离子体物理] TG156.8[理学—物理]