纳米压印光刻中的多步定位研究  

Research on Multi-Step Positioning for Nano Imprint Lithography

作　　者：刘红忠[1] 丁玉成[1] 卢秉恒[1] 王莉[1] 邱志惠[1] 

机构地区：[1]西安交通大学机械制造系统工程国家重点实验室,西安710049

出　　处：《西安交通大学学报》2006年第3期261-264,269,共5页Journal of Xi'an Jiaotong University

基　　金：国家自然科学基金资助项目(50505037);国家重点基础研究发展计划资助项目(2003CB716203);中国博士后科学基金资助项目(2005037242)

摘　　要：在步进重复式压印光刻中,为了避免承片台支撑绞链结构间隙及微观姿态调整往返运动导致的表面材料不规则形变,建立了单调、无振荡、多步逼近目标位置的宏微两级驱动系统,并提出了径向基函数-比例、积分、微分(RBF-PID)及单调位置控制算法.控制结果证明,使用具有强鲁棒性的RBF-PID非线性控制模式,使得驱动过程呈现无超调、无振荡的单调过程,因此避免了由于系统微观振荡调节而引入的间隙误差和材料表面形变误差.此控制方式可使步进重复式压印系统的定位精度在满足100 mm行程驱动的前提下,达到小于10 nm的定位技术指标.In multi-step imprinting lithography process, the gap existing in the hinges of the stage structure and the random motion during the stage position adjustment usually lead to errors quite different from ones in the traditional precision positioning. To avoid these nonlinear errors, a radial basis function-proportional integral differential （RBF-PID） and monotony position controlling algorithm is introduced, which enables the motion locus to appear monotone, non-oscillatory and multi-step approaching, and the random errors from single direction driving mode and the backlash errors by pre-loading control are eliminated completely. The experimental results within motion range of 100 mm confirm that this nonlinearity compensation is very effective to improve the positioning accuracy up to 10 nm during the multi-step imprinting process.

关 键 词：纳米压印光刻 多步定位 非线性控制 

分 类 号：TH112[机械工程—机械设计及理论] TH113.1