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作 者:张剑寒[1] 张宇民[1] 韩杰才[1] 赫晓东[1] 姚旺[1]
机构地区:[1]哈尔滨工业大学复合材料与结构研究所,黑龙江哈尔滨150001
出 处:《光学精密工程》2006年第2期179-184,共6页Optics and Precision Engineering
基 金:国家自然科学基金资助(No.9020503)
摘 要:碳化硅由于其优异的机械性能和热物理性能而成为颇具吸引力的反射镜材料。采用反应烧结碳化硅(RB-SiC)材料制备了空间用反射镜体,用化学气相沉积(CVD)工艺在镜体镜面沉积一层致密的碳化硅薄膜,反射镜采用蜂窝状背面开放式轻量化结构。对直径为250 mm反射镜的组织、性能做了一系列研究测试。结果表明:反射镜体为Si/SiC两相组织,薄膜为单相SiC,反射镜的机械、热性能优异,薄膜与基体结合强度为345.5 MPa,研磨后镜面表面粗糙度达到1.487 nm rms。采用本文工艺方法有能力制备米级直径的空间用碳化硅反射镜。Silicon carbide (SIC) is an attractive mirror material due to its superior mechanical and thermal physical properties compared to conventional optical materials. In this paper,a space-borne mirror blank was fabricated by reaction bonded silicon carbide (RB-SiC),and full density SiC thin film was coated on the surface of mirror blank by Chemical Vapor Deposition(CVD) process. The space-borne mirror is lightweight structure with honeycomb back opened. The microstructure and properties of a 250 mm diameter circular mirror were studied and tested. Experimental results show that the mirror blank is Si/SiC two-phase structure and the film is SiC single phase; SiC mirror has excellent mechanical and thermal property; the adhesion strength stress between substrate and film is 345.5 MPa. After grinding,mirror surface precision is 1. 487 nm rms. The space-borne SiC mirror of meter class diameter can be fabricated by both reaction bonded and CVD process.
关 键 词:空间用反射镜 反应烧结 化学气相沉积 碳化硅 光学加工 光学检验
分 类 号:TH703[机械工程—仪器科学与技术]
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