不同退火温度下ZnO薄膜表面形貌的演变及粗化机制  

Evolution and coarsening mechanism of surface morphology of ZnO film at different annealed temperatures

作　　者：刘莎[1] 史雅琴[1] 

机构地区：[1]大连海事大学机电与材料工程学院,辽宁大连116026

出　　处：《大连海事大学学报》2006年第2期101-105,共5页Journal of Dalian Maritime University

摘　　要：采用磁控溅射方法在Si(001)制备ZnO薄膜,利用原子力显微镜对不同退火温度的ZnO薄膜表面形貌进行表征.结果表明:薄膜的微观形貌、表面粗糙度和分形维数取决于退火温度的变化.在退火温度从室温上升到1000℃过程中,薄膜表面粗糙度逐渐降低,700℃降至最小,而后又迅速粗糙.探讨了不同退火温度下薄膜表面的粗糙机理.ZnO film was prepared by radio- frequency reactive magnetron sputtering on Si （100） substrates. Atomic force microscopy （AFM） has been applied to study the morphological evolution of ZnO film annealed at different temperatures. It was found that surface morphology, surface roughness and fractal dimension of ZnO film depended on the annealed temperature. With the annealed temperature being increased, the surface roughness decreased, and reached to the lowest value at 700℃, then coarsens abruptly with the temperature above 700℃.

关 键 词：ZNO薄膜 磁控溅射 表面形貌 功率谱密度 分形维数 

分 类 号：O484.1[理学—固体物理]