步进扫描投影光刻机剂量控制参量优化新算法研究  

Novel Optimization Algorithm for Dose Control Parameters in Step and Scan Lithography

作　　者：刘世元[1] 吴小健[1] 

机构地区：[1]华中科技大学机械学院微系统研究中心

出　　处：《光学学报》2006年第8期1192-1197,共6页Acta Optica Sinica

基　　金：国家自然科学基金(50205009;50575078)资助课题

摘　　要：提出了一种以生产率、剂量精度与激光器使用成本三者最佳匹配为优化目标的步进扫描投影光刻机剂量控制参量优化新算法及其数学模型,通过将激光器重复频率作为可调参量并引入有效脉冲个数的概念,获得了有效剂量区间内任意给定剂量所应采取的优化策略并给出了剂量控制参量的具体计算方法。理论推导和模拟计算结果表明,新算法既保持了原算法在生产率和剂量精度优化方面的优势,又改进了原算法在激光器成本优化目标上的缺陷。随着准分子激光器及其剂量控制技术的进一步发展,新算法可望更能显示出其优越性并具有更广阔的应用前景。A novel optimization algorithm along with the mathematical model for dose control parameters in a step and scan lithography, aiming at an optimal match of the throughput, dose accuracy and cost of ownership of deep ultraviolet （DUV） excimer laser simultaneously is proposed. With the help of variable laser repetition frequency and introduction of a new concept called effective number of pulses, the optimization strategy for a given dose in the effective dose range is achieved and the detailed method to calculate values of all the dose control parameters is proposed. The theoretical study and numerical simulation demonstrate that the new algorithm not only maintains the advantages in throughput and dose accuracy of the currently used one, but also overcomes its drawback of not considering the reduction of laser cost of ownership. It is fully expected that the novel algorithm will show its superiority and provide a better application with the further improvement of DUV excimer laser and its dose control technology.

关 键 词：深紫外准分子激光 剂量控制 扫描曝光 光刻术 优化算法 

分 类 号：TN248.2[电子电信—物理电子学]