离子源辅助电子束沉积凹印版耐磨层  

Wear Resist Films Grown by Ion Beam Assisted Deposition in Gravure Printing

作　　者：张跃飞[1] 王正铎[1] 付亚波[1] 陈强[1] 张广秋[1] 葛袁静[1] 

机构地区：[1]北京印刷学院等离子体物理及材料研究室,北京102600

出　　处：《真空科学与技术学报》2006年第4期317-320,共4页Chinese Journal of Vacuum Science and Technology

基　　金：北京印刷学院科技研究重点资助项目(No.0800107)

摘　　要：针对凹印版电镀存在的污染和高能耗,采用射频感应偶合(ICP)离子源辅助电子束沉积硬质铬耐磨层,通过控制离子源参数和加入过渡层来提高薄膜与基体的结合力和显微硬度。利用扫描电镜、原子力显微镜、显微硬度计、划痕仪、表面轮廓仪,摩擦磨损仪对膜层的组织结构和性能进行了研究,探讨了在薄膜沉积过程中,离子源工艺参数对薄膜界面结合机理,组织结构和性能的影响。Wear-resist chrome films were grown in gravure printing by ion beam assisted deposition （IBAD）. The microstructures and mechanical properties were characterized by scanning electron microscopy （SEM）, atomic force microscopy （AFM） and various conventional techniques, including indenter, scratch tester and profile meter. The preliminary results show that the mechanical properties of IBAD Cr films grown on Cu or Ni substrate, such as its wear resistance, hardness, surface roughness and interfacial adhesion, are better than that of the electroplafing films and that Al buffer layers considerably improve the quality, microstructures and interfacial adhesion of the Cr films.

关 键 词：离子源辅助沉积 过渡层 离子轰击 附着牢度 

分 类 号：TG174.444[金属学及工艺—金属表面处理]