类镍钽软X射线激光用多层膜反射镜的研制  

Fabrication of multilayer reflective mirrors for Ni-like Ta soft X-ray laser

作　　者：朱京涛[1] 王蓓[1] 徐垚[1] 张众[1] 王风丽[1] 王洪昌[1] 王占山[1] 陈玲燕[1] 

机构地区：[1]同济大学精密光学工程技术研究所物理系,上海200092

出　　处：《光学仪器》2006年第4期146-149,共4页Optical Instruments

基　　金：国家自然科学基金资助项目(60378021;10435050);863资助项目(2005AA843031);ICF探索基金资助项目;教育部新世纪优秀人才支持计划资助项目(NCET-04-0376);同济大学理科发展基金资助项目

摘　　要：设计并制备了工作波长为4.48 nm类镍钽软X射线激光用多层膜反射镜。选择C r/C、C r/Sc为多层膜材料对,模拟了多层膜非理想界面对多层膜反射率的影响。采用直流磁控溅射技术在超光滑硅基片上制备了C r/C、C r/Sc多层膜。利用X射线衍射仪测量了多层膜结构,在德国Bessy II同步辐射上测量了多层膜的反射率,C r/C,C r/Sc多层膜峰值反射率分别为7.50%,6.12%。Near normal incident high reflective multilayer mirrors working at wavelength of 4.48 nm were designed and fabricated for Ni-like Ta X-ray laser. At the wavelength of 4.48 nm, Cr/C and Cr/Sc are suitable material pairs, providing good optical performance, and so have been used for the multilayers presented here. The influence of the imperfect interface to the reflectivity of the multilayer is simulated. Using the direct current magnetron sputtering technique, the Cr/C and Cr/Sc multilayers were deposited on the super-smooth silicon substrate. The periodic thickness and structure of the multilayer were measured by X-ray diffractometer. The reflectivities of these multilayers were measured on beam line UE56/1-PGM at BESSY-Ⅱ, Germany. The measured peak reflectivities were 7.50% and 6. 12% for Cr/C and Cr/Sc multilayer mirrors, respectively.

关 键 词：X光激光 多层膜 反射镜 磁控溅射 同步辐射 

分 类 号：O434[机械工程—光学工程] TB43[理学—光学]