用5晶（7晶）X射线衍线仪研究半导体薄膜材料  

Study a semiconductor film materials using 5-crystal (7-crystal) X-ray diffractometer

作　　者：罗江财[1] 杨晓波[1] 

机构地区：[1]重庆光电技术研究所

出　　处：《半导体光电》1996年第4期374-379,共6页Semiconductor Optoelectronics

摘　　要：５晶（７晶）Ｘ射线衍射仪非常适合于高级半导体单晶，特别是Ⅲ－Ⅴ族和Ⅱ－Ⅵ族化合物半导体及其异质外延层的特性分析。本文将简单地介绍５晶（７晶）Ｘ射线衍射仪，以及在半导体薄膜研究中的结果。crystal(7- crystal) X- ray diffractometer with high resolution is very suitable for analyzing compound semiconductors of Ⅲ-Ⅴ and Ⅱ-Ⅵ family and its heteroepitaxial layers. In this paper, 5-crystal(7-crystal) X-ray diffractometer is introduced and the measurement results of semiconductor film materials are reported briefly.

关 键 词：半导体薄膜 5晶X射线衍射 回摆曲线 

分 类 号：TN304.07[电子电信—物理电子学]