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作 者:杨建荣[1] 王善力[1] 郭世平[1] 何力[1]
机构地区:[1]中国科学院上海技术物理研究所国家红外物理实验室半导体薄膜材料研究中心
出 处:《红外与毫米波学报》1996年第5期327-332,共6页Journal of Infrared and Millimeter Waves
基 金:国家863高技术基金
摘 要:用最新发表的HgCdTe材料的光学常数对MBE工艺生长的HgCdTe/CdTe/GaAs材料的透射光谱进行了理论计算.对受生长工艺破坏的衬底背面再次进行抛光处理,消除因表面不平整引起的漫反射效应,使实验测量得到的光谱曲线与理论计算结果很好地吻合,由此得到的HgCdTe和CdTe外延层的厚度和解理面上用显微镜测量的数值相同,准确度优于±0.2μm.确定HgCdTe组分的准确度优于±0.The optical constants published recently of HgCdTe were used for the calculation of the infrared transminssion spectra of MBE grown HgCdTe/CdTe/GaAs structures. After the damaged backside surfaces of the substrate were carefully polished once again to eliminate diffuse reflection effect,the experimental curves of the infrared transmission spectra can be quantitatively reproduced by the theoretical calculation. The epilayer thicknesses of HgCdTe and CdTe determined by a computer fitting procedure were consistent with that by optic microscope observation. The precision of the thickness deduced by the present method is better than ±0.2μm,and the precision of the composition is better than ±0.0025.
分 类 号:TN213[电子电信—物理电子学] O484.4[理学—固体物理]
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