掺钨类金刚石膜的制备与性能研究  

Study on the properties of diamond-like carbon films doped with W deposited by ion technology

作　　者：侯惠君[1] 李洪武[1] 林松盛[1] 朱霞高[1] 林凯生[1] 代明江[1] 

机构地区：[1]广州有色金属研究院,广东广州510651

出　　处：《广东有色金属学报》2006年第3期184-187,共4页Journal of Guangdong Non-Ferrous Metals

摘　　要：采用无灯丝长条离子源结合非平衡磁控溅射的方法，在不同基体上制备了面积较大、光滑、均匀的掺钨类金刚石（W-DLC）膜层，用SEM、Raman、XPS、XRD、硬度计、划痕仪、摩擦磨损试验机等手段分析和研究了膜层的形貌、结构及部分性能．结果表明：膜／基硬度高，W—DLC／Si为Hv0.02515=3577；膜／基结合力在45-75N之间；摩擦系数小，抗磨损性能良好．Diamond-like carbon films （W-DLC） doped with W was synthesized successfully by a combinative non-filament ion beam source and unbalanced magnetron sputtering deposition technology. SEM, Raman, XPS, XRD, microhardness-tester, friction and wear tester and Scratching Tester have been used to investigate the performance of the films. The results show that the W-DLC films have superior performance such as high hardness （Hv0.02515 = 3577）, high adherence （45-75N）, low friction coefficient and superior wear-resistance.

关 键 词：掺钨类金刚石膜 无灯丝离子源 非平衡磁控溅射 

分 类 号：O484.1[理学—固体物理]