RF-PCVD低温沉积无色透明类金刚石保护膜的工艺研究  

Study on the process parameters of colorless transparent diamond-like carbon(DLC) films deposited by RF-PCVD

作　　者：朱霞高[1] 侯惠君[1] 林松盛[1] 袁镇海[1] 戴达煌[1] 

机构地区：[1]广州有色金属研究院,广东广州510651

出　　处：《广东有色金属学报》2006年第3期188-191,共4页Journal of Guangdong Non-Ferrous Metals

摘　　要：采用磁约束增强射频辉光放电等离子体辅助化学气相沉积法（RF—PCVD）低温沉积出无色透明的类金刚石保护膜（DLC），主要研究了炉压P0、射频功率Pf、自生负偏压U2、磁感应强度B、电极间距d、反应气体、镀膜时间t等工艺参数对成膜的影响．试验结果表明，外加磁场B制约了带电粒子逃逸出电极空间，提高了反应气体的离化率及等离子体浓度和活性，并使非独立变量Pf和Uz成为独立变量，有利于工艺调节．当极间距大时，需适当提高Pf，Uz和C-H流量才可得到无色、较硬的DLC膜．在比功率密度大于0．009W·cm^-2·Pa^-1、C-H浓度即体积分数0．9％～1．4％及膜厚小于90nm的条件下，可沉积出无色透明、硬度较高的DLC膜．In this paper, by introducing the external magnetic field to enhance the plasma density of the radio-frequency plasma chemical vapor deposition （RF-PCVD）, colorless transparent hard Diamond-like Carbon films （DLC） were deposited on the glass substrate at low temperature（〈150℃） successfully. We studied the relation of the film quality and the main process parameters of the RF-PCVD such as chamber pressure （P0）, RF power（Pf）, self-bias（Uz）, magnetic field strength（B）, electrode distance（d）, reaction gases,deposition time （t）, etc. The results showed that the introduced magnetic field B restricted the charged particles from escaping from electrode space, so the ionization degree of the reaction gases, the plasma density and the plasma activity were increased. Nonindependent parameters Pf and Uz became independent at the function of magnetic field B, this was beneficial to the adjustment of deposition process parameters. In order to deposite colorless transparent hard DLC films, Pf,Uz and C-H must be increased if the electrode distance（d） was added. Colorless transparent hard DLC films could be deposited if ρwas higher than 0. 009 W · cm^-2 · Pa^-1 , the volume percent of the C-H was 0.9%-1.4% and the thickness of the DLC films was within 90nm.

关 键 词：射频辉光放电等离子体辅助化学气相沉积 类金刚石膜 比功率密度 磁感应强度 

分 类 号：O484.1[理学—固体物理]