SrBi_2Ta_2O_9铁电薄膜的三阶非线性光学性能的研究  

Third-order nonlinear optical properties of SrBi_2Ta_2O_9 thin films

作　　者：王忠太[1] 顾豪爽[1] 陈侃松[1] 徐利[1] 

机构地区：[1]湖北大学物理学与电子技术学院,武汉430062

出　　处：《功能材料与器件学报》2006年第5期461-464,共4页Journal of Functional Materials and Devices

基　　金：国家自然科学基金资助项目(No.50272020);教育部科学技术研究重点项目(No.03084);湖北省创新研究群体科学基金

摘　　要：采用射频磁控溅射法在石英玻璃衬底上制备出均匀透明的SrB i2Ta2O9(SBT)薄膜,根据透射谱计算表明薄膜样品厚度为349nm,线性折射率为3.05。以锁模Nd:YAG激光器作为光源,利用Z-scan技术测定了薄膜的非线性光学性能。结果表明薄膜的非线性折射率n2=2.56×10-8esu,非线性光吸收系数β=3.93×10-4esu,其三阶非线性极化率的实部和虚部分别为:Reχ(3)=8.29×10-9esu和Imχ(3)=1.08×10-9esu。The SrBi2Ta2O9 thin films were prepared on quartz substrates by using the RF magnetron sputtering method. The thickness of the thin film is 349nm and the linear refractive index was 3.05. The third - order nonlinear optical properties of the films were measured by the Z - scan technique. The nonlinear refractive index n2 and the nonlinear absorption index fl at 532nm wavelength are 2.56 × 10^-8Sesu and 3.9 × 10^-4esu,respectively. The real part of the third -order nonlinear optical susceptibility X^（3） is 8.29 × 10^-9esu and its imaginary part is 1.08 × 10^-9esu .

关 键 词：SrBi2Ta2O9 铁电薄膜 磁控溅射 Z—scan 三阶光学非线性 

分 类 号：O484.41[理学—固体物理]